Chemical abrasion: the mechanics of zircon dissolution
<p>Chemical abrasion is a technique that combines thermal annealing and partial dissolution in hydrofluoric acid (HF) to selectively remove radiation-damaged portions of zircon crystals prior to U–Pb isotopic analysis, and it is applied ubiquitously to zircon prior to U–Pb isotope dilution the...
| Main Authors: | , , , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
Copernicus Publications
2023-04-01
|
| Series: | Geochronology |
| Online Access: | https://gchron.copernicus.org/articles/5/127/2023/gchron-5-127-2023.pdf |