Freestanding HfO<sub>2 </sub>grating fabricated by fast atom beam etching
<p>Abstract</p> <p>We report here the fabrication of freestanding HfO<sub>2 </sub>grating by combining fast atom beam etching (FAB) of HfO<sub>2 </sub>film with dry etching of silicon substrate. HfO<sub>2 </sub>film is deposited onto silicon subs...
| Main Authors: | , , , |
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| Format: | Article |
| Language: | English |
| Published: |
SpringerOpen
2011-01-01
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| Series: | Nanoscale Research Letters |
| Subjects: | |
| Online Access: | http://www.nanoscalereslett.com/content/6/1/367 |