Fast Acoustic Light Sculpting for On‐Demand Maskless Lithography
Abstract Light interference is the primary enabler of a number of optical maskless techniques for the large‐scale processing of materials at the nanoscale. However, methods controlling interference phenomena can be limited in speed, ease of implementation, or the selection of pattern designs. Here,...
Main Authors: | Salvatore Surdo, Martí Duocastella |
---|---|
Format: | Article |
Language: | English |
Published: |
Wiley
2019-07-01
|
Series: | Advanced Science |
Subjects: | |
Online Access: | https://doi.org/10.1002/advs.201900304 |
Similar Items
-
Nanopatterning with Photonic Nanojets: Review and Perspectives in Biomedical Research
by: Salvatore Surdo, et al.
Published: (2021-03-01) -
Optical Sensitivity of Waveguides Inscribed in Nanoporous Silicate Framework
by: Zhong Lijing, et al.
Published: (2021-01-01) -
Diffractive optics for maskless lithography and imaging
by: Menon, Rajesh, 1976-
Published: (2005) -
Development of an immersion maskless lithography system
by: Chao, David, Ph. D. Massachusetts Institute of Technology
Published: (2006) -
An Autofocus Method Based on Improved Differential Confocal Microscopy in Two-Photon Lithography
by: Zhenyu Yang, et al.
Published: (2023-03-01)