Gap-directed chemical lift-off lithographic nanoarchitectonics for arbitrary sub-micrometer patterning

Gap-directed chemical lift-off lithographic nanoarchitectonics for arbitrary sub-micrometer patterning

We introduce a unique soft lithographic operation that exploits stamp roof collapse-induced gaps to selectively remove an alkanethiol self-assembled monolayer (SAM) on Au to generate surface patterns that are orders of magnitude smaller than structures on the original elastomer stamp. The smallest a...

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Bibliographic Details
Main Authors: Chang-Ming Wang, Hong-Sheng Chan, Chia-Li Liao, Che-Wei Chang, Wei-Ssu Liao
Format: Article
Language:English
Published: Beilstein-Institut 2023-01-01
Series:Beilstein Journal of Nanotechnology
Subjects:
chemical lift-off lithography
gap
self-assembled monolayer
sub-micrometer
surface patterning
Online Access:https://doi.org/10.3762/bjnano.14.4

Internet

https://doi.org/10.3762/bjnano.14.4

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