High-performance temperature control system for resistance furnace annealing and crystal growth of semiconductor compounds
This paper describes the control system for the annealing and growth of semiconductor crystals. In this process, precise temperature control is crucial to obtain high-quality samples. For this reason, a high-performance temperature control based on the PID controller augmented in the gain-scheduling...
| Main Authors: | , , |
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| Format: | Article |
| Language: | English |
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Elsevier
2023-03-01
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| Series: | Results in Engineering |
| Subjects: | |
| Online Access: | http://www.sciencedirect.com/science/article/pii/S2590123022005333 |
| _version_ | 1797975838729175040 |
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| author | R. Surus K. Strzałkowski T. Tarczewski |
| author_facet | R. Surus K. Strzałkowski T. Tarczewski |
| author_sort | R. Surus |
| collection | DOAJ |
| description | This paper describes the control system for the annealing and growth of semiconductor crystals. In this process, precise temperature control is crucial to obtain high-quality samples. For this reason, a high-performance temperature control based on the PID controller augmented in the gain-scheduling (G-S) path has been applied. To overcome the drawback related to the synthesis procedure of the controller directly on the plant, the modeling stage has been introduced. At this stage, in the MATLAB/Simulink environment, a simulation model was built, the task of which is to approximate the operation of the test stand. Simulation and experimental tests indicate an advantage of the proposed control system compared to the reference solution. Simulations and experiments were performed for the PID controller in standard configuration and with G-S. A shortening of the temperature output signal rise time for a system with G-S was observed compared to a standard close system. |
| first_indexed | 2024-04-11T04:41:49Z |
| format | Article |
| id | doaj.art-ec997a687f2a441f8b2bf84fe40fbcbe |
| institution | Directory Open Access Journal |
| issn | 2590-1230 |
| language | English |
| last_indexed | 2024-04-11T04:41:49Z |
| publishDate | 2023-03-01 |
| publisher | Elsevier |
| record_format | Article |
| series | Results in Engineering |
| spelling | doaj.art-ec997a687f2a441f8b2bf84fe40fbcbe2022-12-28T04:19:19ZengElsevierResults in Engineering2590-12302023-03-0117100863High-performance temperature control system for resistance furnace annealing and crystal growth of semiconductor compoundsR. Surus0K. Strzałkowski1T. Tarczewski2Institute of Engineering and Technology, Faculty of Physics, Astronomy and Informatics, Nicolaus Copernicus, University in Toruń, ul. Grudziądzka 5, 87-100, Toruń, Poland; Corresponding author.Institute of Physics, Faculty of Physics, Astronomy and Informatics, Nicolaus Copernicus University in Toruń, ul. Grudziądzka 5, 87-100, Toruń, PolandInstitute of Engineering and Technology, Faculty of Physics, Astronomy and Informatics, Nicolaus Copernicus, University in Toruń, ul. Grudziądzka 5, 87-100, Toruń, PolandThis paper describes the control system for the annealing and growth of semiconductor crystals. In this process, precise temperature control is crucial to obtain high-quality samples. For this reason, a high-performance temperature control based on the PID controller augmented in the gain-scheduling (G-S) path has been applied. To overcome the drawback related to the synthesis procedure of the controller directly on the plant, the modeling stage has been introduced. At this stage, in the MATLAB/Simulink environment, a simulation model was built, the task of which is to approximate the operation of the test stand. Simulation and experimental tests indicate an advantage of the proposed control system compared to the reference solution. Simulations and experiments were performed for the PID controller in standard configuration and with G-S. A shortening of the temperature output signal rise time for a system with G-S was observed compared to a standard close system.http://www.sciencedirect.com/science/article/pii/S2590123022005333Gain-scheduling PID controlSemiconductor crystals growthResistance furnace |
| spellingShingle | R. Surus K. Strzałkowski T. Tarczewski High-performance temperature control system for resistance furnace annealing and crystal growth of semiconductor compounds Results in Engineering Gain-scheduling PID control Semiconductor crystals growth Resistance furnace |
| title | High-performance temperature control system for resistance furnace annealing and crystal growth of semiconductor compounds |
| title_full | High-performance temperature control system for resistance furnace annealing and crystal growth of semiconductor compounds |
| title_fullStr | High-performance temperature control system for resistance furnace annealing and crystal growth of semiconductor compounds |
| title_full_unstemmed | High-performance temperature control system for resistance furnace annealing and crystal growth of semiconductor compounds |
| title_short | High-performance temperature control system for resistance furnace annealing and crystal growth of semiconductor compounds |
| title_sort | high performance temperature control system for resistance furnace annealing and crystal growth of semiconductor compounds |
| topic | Gain-scheduling PID control Semiconductor crystals growth Resistance furnace |
| url | http://www.sciencedirect.com/science/article/pii/S2590123022005333 |
| work_keys_str_mv | AT rsurus highperformancetemperaturecontrolsystemforresistancefurnaceannealingandcrystalgrowthofsemiconductorcompounds AT kstrzałkowski highperformancetemperaturecontrolsystemforresistancefurnaceannealingandcrystalgrowthofsemiconductorcompounds AT ttarczewski highperformancetemperaturecontrolsystemforresistancefurnaceannealingandcrystalgrowthofsemiconductorcompounds |