Guiding Chart for Initial Layer Choice with Nanoimprint Lithography
When nanoimprint serves as a lithography process, it is most attractive for the ability to overcome the typical residual layer remaining without the need for etching. Then, ‘partial cavity filling’ is an efficient strategy to provide a negligible residual layer. However, this strategy requires an ad...
| Main Authors: | , |
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| 格式: | 文件 |
| 语言: | English |
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MDPI AG
2021-03-01
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| 丛编: | Nanomaterials |
| 主题: | |
| 在线阅读: | https://www.mdpi.com/2079-4991/11/3/710 |