Interfaces in Atomic Layer Deposited Films: Opportunities and Challenges

Interfaces in Atomic Layer Deposited Films: Opportunities and Challenges

Atomic layer deposition (ALD) is an effective method for precise layer‐wise growth of thin‐film materials and has allowed for substantial progress in a variety of fields. Advances in the technique have instigated high‐level interpretations of the relationship between nanostructure architecture and p...

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Bibliographic Details
Main Authors: Syed Jazib Abbas Zaidi, Jae Chan Park, Ji Won Han, Ji Hyeon Choi, Muhammad Aanish Ali, Muhammad Abdul Basit, Tae Joo Park
Format: Article
Language:English
Published: Wiley-VCH 2023-10-01
Series:Small Science
Subjects:
atomic layer deposition
freestanding 2D layers
high-k layers
seeding layers
2D electron gas
Online Access:https://doi.org/10.1002/smsc.202300060

Internet

https://doi.org/10.1002/smsc.202300060

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