Two dimensional radial gas flows in atmospheric pressure plasma-enhanced chemical vapor deposition

Two dimensional radial gas flows in atmospheric pressure plasma-enhanced chemical vapor deposition

Atmospheric pressure (AP) operation of plasma-enhanced chemical vapor deposition (PECVD) is one of promising concepts for high quality and low cost processing. Atmospheric plasma discharge requires narrow gap configuration, which causes an inherent feature of AP PECVD. Two dimensional radial gas flo...

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Bibliographic Details
Main Authors: Gwihyun Kim, Seran Park, Hyunsu Shin, Seungho Song, Hoon-Jung Oh, Dae Hong Ko, Jung-Il Choi, Seung Jae Baik
Format: Article
Language:English
Published: AIP Publishing LLC 2017-12-01
Series:AIP Advances
Online Access:http://dx.doi.org/10.1063/1.4996797

Internet

http://dx.doi.org/10.1063/1.4996797

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