Characterization upon electrical hysteresis and thermal diffusion of TiAl<sub>3</sub>O<sub> <it>x </it> </sub>dielectric film

Characterization upon electrical hysteresis and thermal diffusion of TiAl<sub>3</sub>O<sub> <it>x </it> </sub>dielectric film

<p>Abstract</p> <p>In this paper, we have investigated the electrical properties of TiAl<sub>3</sub>O<sub> <it>x </it> </sub>film as electrical gate insulator deposited by pulsed laser deposition and presented a simple method to describe the ther...

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Bibliographic Details
Main Authors: Liu Zhiguo, Shi Lei
Format: Article
Language:English
Published: SpringerOpen 2011-01-01
Series:Nanoscale Research Letters
Subjects:
electrical hysteresis
thermal diffusion
pulsed laser deposition
Online Access:http://www.nanoscalereslett.com/content/6/1/557

Internet

http://www.nanoscalereslett.com/content/6/1/557

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