Characterization upon electrical hysteresis and thermal diffusion of TiAl<sub>3</sub>O<sub> <it>x </it> </sub>dielectric film

<p>Abstract</p> <p>In this paper, we have investigated the electrical properties of TiAl<sub>3</sub>O<sub> <it>x </it> </sub>film as electrical gate insulator deposited by pulsed laser deposition and presented a simple method to describe the ther...

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Main Authors: Liu Zhiguo, Shi Lei
Format: Article
Language:English
Published: SpringerOpen 2011-01-01
Series:Nanoscale Research Letters
Subjects:
Online Access:http://www.nanoscalereslett.com/content/6/1/557
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author Liu Zhiguo
Shi Lei
author_facet Liu Zhiguo
Shi Lei
author_sort Liu Zhiguo
collection DOAJ
description <p>Abstract</p> <p>In this paper, we have investigated the electrical properties of TiAl<sub>3</sub>O<sub> <it>x </it> </sub>film as electrical gate insulator deposited by pulsed laser deposition and presented a simple method to describe the thermal diffusion behaviors of metal atoms at TiAl<sub>3</sub>O<sub> <it>x</it> </sub>/Si interfacial region in detail. The TiAl<sub>3</sub>O<sub> <it>x </it> </sub>films show obvious electrical hysteresis by the capacitance-voltage measurements after post-annealing treatment. By virtue of the diffusion models composed of TiAl<sub>3</sub>O<sub> <it>x </it> </sub>film and silicon, the diffusion coefficient and the diffusion activation energy of the Ti and Al atoms are extracted. It is valuable to further investigate the pseudobinary oxide system in practice.</p> <p> <b>PACS: </b>77.55.-g; 81.15.Fg; 81.40.Gh.</p>
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spelling doaj.art-ed66ef82a06a4bfe94e749bf3ce807da2023-09-02T10:19:10ZengSpringerOpenNanoscale Research Letters1931-75731556-276X2011-01-0161557Characterization upon electrical hysteresis and thermal diffusion of TiAl<sub>3</sub>O<sub> <it>x </it> </sub>dielectric filmLiu ZhiguoShi Lei<p>Abstract</p> <p>In this paper, we have investigated the electrical properties of TiAl<sub>3</sub>O<sub> <it>x </it> </sub>film as electrical gate insulator deposited by pulsed laser deposition and presented a simple method to describe the thermal diffusion behaviors of metal atoms at TiAl<sub>3</sub>O<sub> <it>x</it> </sub>/Si interfacial region in detail. The TiAl<sub>3</sub>O<sub> <it>x </it> </sub>films show obvious electrical hysteresis by the capacitance-voltage measurements after post-annealing treatment. By virtue of the diffusion models composed of TiAl<sub>3</sub>O<sub> <it>x </it> </sub>film and silicon, the diffusion coefficient and the diffusion activation energy of the Ti and Al atoms are extracted. It is valuable to further investigate the pseudobinary oxide system in practice.</p> <p> <b>PACS: </b>77.55.-g; 81.15.Fg; 81.40.Gh.</p>http://www.nanoscalereslett.com/content/6/1/557electrical hysteresisthermal diffusionpulsed laser deposition
spellingShingle Liu Zhiguo
Shi Lei
Characterization upon electrical hysteresis and thermal diffusion of TiAl<sub>3</sub>O<sub> <it>x </it> </sub>dielectric film
Nanoscale Research Letters
electrical hysteresis
thermal diffusion
pulsed laser deposition
title Characterization upon electrical hysteresis and thermal diffusion of TiAl<sub>3</sub>O<sub> <it>x </it> </sub>dielectric film
title_full Characterization upon electrical hysteresis and thermal diffusion of TiAl<sub>3</sub>O<sub> <it>x </it> </sub>dielectric film
title_fullStr Characterization upon electrical hysteresis and thermal diffusion of TiAl<sub>3</sub>O<sub> <it>x </it> </sub>dielectric film
title_full_unstemmed Characterization upon electrical hysteresis and thermal diffusion of TiAl<sub>3</sub>O<sub> <it>x </it> </sub>dielectric film
title_short Characterization upon electrical hysteresis and thermal diffusion of TiAl<sub>3</sub>O<sub> <it>x </it> </sub>dielectric film
title_sort characterization upon electrical hysteresis and thermal diffusion of tial sub 3 sub o sub it x it sub dielectric film
topic electrical hysteresis
thermal diffusion
pulsed laser deposition
url http://www.nanoscalereslett.com/content/6/1/557
work_keys_str_mv AT liuzhiguo characterizationuponelectricalhysteresisandthermaldiffusionoftialsub3subosubitxitsubdielectricfilm
AT shilei characterizationuponelectricalhysteresisandthermaldiffusionoftialsub3subosubitxitsubdielectricfilm