Top-Down Nanofabrication and Characterization of 20 nm Silicon Nanowires for Biosensing Applications.

Top-Down Nanofabrication and Characterization of 20 nm Silicon Nanowires for Biosensing Applications.

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A top-down nanofabrication approach is used to develop silicon nanowires from silicon-on-insulator (SOI) wafers and involves direct-write electron beam lithography (EBL), inductively coupled plasma-reactive ion etching (ICP-RIE) and a size reduction process. To achieve nanometer scale size, the cruc...

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Bibliographic Details
Main Authors: M N M Nuzaihan, U Hashim, M K Md Arshad, A Rahim Ruslinda, S F A Rahman, M F M Fathil, Mohd H Ismail
Format: Article
Language:English
Published: Public Library of Science (PLoS) 2016-01-01
Series:PLoS ONE
Online Access:http://europepmc.org/articles/PMC4811568?pdf=render

Internet

http://europepmc.org/articles/PMC4811568?pdf=render

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