Measurement of short-range PSF in EBL
Experimental measurement for Short Range (SR) part of PSF in EBL is essential for at least three reasons: Proximity effect correction, the study of the resolution limit of electron lithography, and characterizing the beam size of an EBL instrument. In this work, we introduce a measurement technique...
| Main Authors: | , , |
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| Format: | Article |
| Language: | English |
| Published: |
Elsevier
2024-03-01
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| Series: | Micro and Nano Engineering |
| Subjects: | |
| Online Access: | http://www.sciencedirect.com/science/article/pii/S2590007224000017 |