Characterization of TiO2 thin films deposited by using dc magnetron sputtering
Titanium dioxide thin films were deposited on silicon (111) and glass substrates by using direct current (dc) magnetron sputtering system. Thin films were deposited with different O2 gas flow rate (1, 3, 9, 12 sccm) while keeping Ar gas flow rate constant at 30 sccm. The samples exhibit amorphous ph...
| Main Authors: | , |
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| Format: | Article |
| Language: | English |
| Published: |
Applied Science Innovations Private Limited
2016-06-01
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| Series: | Carbon: Science and Technology |
| Subjects: | |
| Online Access: | http://www.applied-science-innovations.com/cst-web-site/CST-8-2-2016/CST-184-8-2-2016-1-8.pdf |