A Fast Recovery SiC TED MOS MOSFET with Schottky Barrier Diode (SBD)

Achieving low conduction loss and good channel mobility is crucial for SiC MOSFETs. However, basic planar SiC MOSFETs provide challenges due to their high density of interface traps and significant gate-to-drain capacitance. In order to enhance the reverse recovery property of the device, a Schottky...

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Main Authors: Hongyu Cheng, Wenmao Li, Peiran Wang, Jianguo Chen, Qing Wang, Hongyu Yu
Format: Article
Language:English
Published: MDPI AG 2023-04-01
Series:Crystals
Subjects:
Online Access:https://www.mdpi.com/2073-4352/13/4/650
_version_ 1827745405643784192
author Hongyu Cheng
Wenmao Li
Peiran Wang
Jianguo Chen
Qing Wang
Hongyu Yu
author_facet Hongyu Cheng
Wenmao Li
Peiran Wang
Jianguo Chen
Qing Wang
Hongyu Yu
author_sort Hongyu Cheng
collection DOAJ
description Achieving low conduction loss and good channel mobility is crucial for SiC MOSFETs. However, basic planar SiC MOSFETs provide challenges due to their high density of interface traps and significant gate-to-drain capacitance. In order to enhance the reverse recovery property of the device, a Schottky barrier diode (SBD) was added to the source contact area, the top of the current spreading region, of a trench-etched double-diffused SiC MOS (TED MOS). Two types of SBD structures were optimized to improve the electrical properties using 3D simulation software, “TCAD Silvaco”. During reverse recovery simulation, the carriers of the device were withdrawn from the SBD, indicating that the new design was effective. It also showed that the recovery properties of the new design depended on temperature, carrier lifetime, and the work functions of metals. All the new designs were evaluated in various circumstances to determine the trend. Ultimately, in high-speed switching circuits, the SiC TED MOS with SBD structure efficiently boosted switching speed, while reducing switching loss.
first_indexed 2024-03-11T05:07:34Z
format Article
id doaj.art-ef0d889061f5446184a788f16839fc70
institution Directory Open Access Journal
issn 2073-4352
language English
last_indexed 2024-03-11T05:07:34Z
publishDate 2023-04-01
publisher MDPI AG
record_format Article
series Crystals
spelling doaj.art-ef0d889061f5446184a788f16839fc702023-11-17T18:51:32ZengMDPI AGCrystals2073-43522023-04-0113465010.3390/cryst13040650A Fast Recovery SiC TED MOS MOSFET with Schottky Barrier Diode (SBD)Hongyu Cheng0Wenmao Li1Peiran Wang2Jianguo Chen3Qing Wang4Hongyu Yu5School of Microelectronics, Southern University of Science and Technology, Shenzhen 518055, ChinaSchool of Microelectronics, Southern University of Science and Technology, Shenzhen 518055, ChinaSchool of Microelectronics, Southern University of Science and Technology, Shenzhen 518055, ChinaFounder Microelectronics International Co., Ltd., Shenzhen 518116, ChinaSchool of Microelectronics, Southern University of Science and Technology, Shenzhen 518055, ChinaSchool of Microelectronics, Southern University of Science and Technology, Shenzhen 518055, ChinaAchieving low conduction loss and good channel mobility is crucial for SiC MOSFETs. However, basic planar SiC MOSFETs provide challenges due to their high density of interface traps and significant gate-to-drain capacitance. In order to enhance the reverse recovery property of the device, a Schottky barrier diode (SBD) was added to the source contact area, the top of the current spreading region, of a trench-etched double-diffused SiC MOS (TED MOS). Two types of SBD structures were optimized to improve the electrical properties using 3D simulation software, “TCAD Silvaco”. During reverse recovery simulation, the carriers of the device were withdrawn from the SBD, indicating that the new design was effective. It also showed that the recovery properties of the new design depended on temperature, carrier lifetime, and the work functions of metals. All the new designs were evaluated in various circumstances to determine the trend. Ultimately, in high-speed switching circuits, the SiC TED MOS with SBD structure efficiently boosted switching speed, while reducing switching loss.https://www.mdpi.com/2073-4352/13/4/650TED MOSSchottky contactreverse recovery
spellingShingle Hongyu Cheng
Wenmao Li
Peiran Wang
Jianguo Chen
Qing Wang
Hongyu Yu
A Fast Recovery SiC TED MOS MOSFET with Schottky Barrier Diode (SBD)
Crystals
TED MOS
Schottky contact
reverse recovery
title A Fast Recovery SiC TED MOS MOSFET with Schottky Barrier Diode (SBD)
title_full A Fast Recovery SiC TED MOS MOSFET with Schottky Barrier Diode (SBD)
title_fullStr A Fast Recovery SiC TED MOS MOSFET with Schottky Barrier Diode (SBD)
title_full_unstemmed A Fast Recovery SiC TED MOS MOSFET with Schottky Barrier Diode (SBD)
title_short A Fast Recovery SiC TED MOS MOSFET with Schottky Barrier Diode (SBD)
title_sort fast recovery sic ted mos mosfet with schottky barrier diode sbd
topic TED MOS
Schottky contact
reverse recovery
url https://www.mdpi.com/2073-4352/13/4/650
work_keys_str_mv AT hongyucheng afastrecoverysictedmosmosfetwithschottkybarrierdiodesbd
AT wenmaoli afastrecoverysictedmosmosfetwithschottkybarrierdiodesbd
AT peiranwang afastrecoverysictedmosmosfetwithschottkybarrierdiodesbd
AT jianguochen afastrecoverysictedmosmosfetwithschottkybarrierdiodesbd
AT qingwang afastrecoverysictedmosmosfetwithschottkybarrierdiodesbd
AT hongyuyu afastrecoverysictedmosmosfetwithschottkybarrierdiodesbd
AT hongyucheng fastrecoverysictedmosmosfetwithschottkybarrierdiodesbd
AT wenmaoli fastrecoverysictedmosmosfetwithschottkybarrierdiodesbd
AT peiranwang fastrecoverysictedmosmosfetwithschottkybarrierdiodesbd
AT jianguochen fastrecoverysictedmosmosfetwithschottkybarrierdiodesbd
AT qingwang fastrecoverysictedmosmosfetwithschottkybarrierdiodesbd
AT hongyuyu fastrecoverysictedmosmosfetwithschottkybarrierdiodesbd