Computational fluid dynamics modeling of a wafer etch temperature control system
Next-generation etching processes for semiconductor manufacturing exploit the potential of a variety of operating conditions, including cryogenic conditions at which high etch rates of silicon and very low etch rates of the photoresist are achieved. Thus, tight control of wafer temperature must be m...
| Main Authors: | , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Elsevier
2023-09-01
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| Series: | Digital Chemical Engineering |
| Subjects: | |
| Online Access: | http://www.sciencedirect.com/science/article/pii/S2772508123000200 |