Atomic Layer Deposition of Nanolayered Carbon Films
In this paper, carbon thin films were grown using the plasma-enhanced atomic layer deposition (PE-ALD). Methane (CH<sub>4</sub>) was used as the carbon precursor to grow the carbon thin film. The grown film was analyzed by the high-resolution transmission electron micrograph (TEM), X-ray...
| Main Authors: | , , |
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| Format: | Article |
| Language: | English |
| Published: |
MDPI AG
2021-09-01
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| Series: | C |
| Subjects: | |
| Online Access: | https://www.mdpi.com/2311-5629/7/4/67 |