Weakly Supervised Image Segmentation for Detecting Defects From Scanning Electron Microscopy Images in Semiconductor
The continuous miniaturization of semiconductor patterns improves performance but also leads to frequent pattern disruptions that significantly reduce manufacturing yields. In the field, scanning electron microscope (SEM) images of defects are analyzed to gain insight for improvement. However, manua...
| Autori principali: | , |
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| Natura: | Articolo |
| Lingua: | English |
| Pubblicazione: |
IEEE
2024-01-01
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| Serie: | IEEE Access |
| Soggetti: | |
| Accesso online: | https://ieeexplore.ieee.org/document/10786013/ |