The Variables and Invariants in the Evolution of Logic Optical Lithography Process

The Variables and Invariants in the Evolution of Logic Optical Lithography Process

Photolithography has been a major enabler for the continuous shrink of the semiconductor manufacturing design rules. Throughout the years of the development of the photolithography, many new technologies have been invented and successfully implemented, such as image projection lithography, chemicall...

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Bibliographic Details
Main Author: Qiang Wu
Format: Article
Language:English
Published: JommPublish 2019-02-01
Series:Journal of Microelectronic Manufacturing
Subjects:
image projection photolithography
imaging contrast
exposure latitude
mask error factor
linewidth uniformity
chemically amplified photoresist
phase shifting mask
optical proximity correction
photoacid diffusion length
Online Access:http://www.jommpublish.org/p/22/#

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http://www.jommpublish.org/p/22/#

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