Synthesis of ZrN Film Via the Plasma Sputter-Type Negative Ion Source
A plasma sputter-type negative ion source is used in the production of high grade coatings of zirconium mononitride (ZrN) on copper substrate. It presents a new approach for the production of ZrN thin films. The ion source was operated in its target/gas mode. Zirconium metal is used as target and ar...
| Main Authors: | , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
University of the Philippines
1999-12-01
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| Series: | Science Diliman |
| Subjects: | |
| Online Access: | http://journals.upd.edu.ph/index.php/sciencediliman/article/view/242 |