Synthesis of ZrN Film Via the Plasma Sputter-Type Negative Ion Source
A plasma sputter-type negative ion source is used in the production of high grade coatings of zirconium mononitride (ZrN) on copper substrate. It presents a new approach for the production of ZrN thin films. The ion source was operated in its target/gas mode. Zirconium metal is used as target and ar...
Main Authors: | Nico Valmoria, Alexander Mendenilla, Miguel Yambot, Manolo Mena, Henry Ramos |
---|---|
Format: | Article |
Language: | English |
Published: |
University of the Philippines
1999-12-01
|
Series: | Science Diliman |
Subjects: | |
Online Access: | http://journals.upd.edu.ph/index.php/sciencediliman/article/view/242 |
Similar Items
-
Radiation Resistance of Multilayer Nanostructured Coatings nc-ZrN/a-ZrCu Irradiated with Helium Ions
by: Vladimir V. Uglov, et al.
Published: (2022-12-01) -
Ion-beam irradiation effects on reactively sputtered CrN layers
by: Mirjana Novaković, et al.
Published: (2011-03-01) -
Ion implantation and ion beam analysis techniques in corrosion studies /
by: Conference on Ion Implantation and Ion Beam Analysis Techniques in Corrosion Studies (1975: Manchester)
Published: (1976) -
Ferroelectricity and ferroelectric resistive switching in sputtered Hf0.5Zr0.5O2 thin films
by: Fan, Zhen, et al.
Published: (2016) -
Acceleration of ions to tens of giga electron-volts in the interaction of two color laser with relativistic thin layer plasma
by: M Moshkelgosha, et al.
Published: (2022-02-01)