Flowrate control methods based on PLC in wafer clean tool
Several in common use flowrate control methods in semiconductor wafer clean tool are introduced in this paper, including the flowrate control of process chamber and chemical proportioning, then corresponding control methods are brought forward according to different applications. The chemical flowra...
| Main Authors: | , |
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| Format: | Article |
| Language: | zho |
| Published: |
National Computer System Engineering Research Institute of China
2018-04-01
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| Series: | Dianzi Jishu Yingyong |
| Subjects: | |
| Online Access: | http://www.chinaaet.com/article/3000080488 |