Strain and atomic stacking of bismuth thin film in its quasi-van der Waals epitaxy on (111) Si substrate

Abstract We report on the structural properties of Bi thin films grown on (111) Si substrates with a thickness of 22–30 BL. HRXRD and EBSD measurements show that these Bi films are mainly composed of twinning grains in the (0003) direction. The grain size can be as large as tens of microns. From a d...

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Bibliographic Details
Main Authors: Chia-Hsuan Wu, Chieh Chou, Hao-Hsiung Lin
Format: Article
Language:English
Published: Nature Portfolio 2023-11-01
Series:Scientific Reports
Online Access:https://doi.org/10.1038/s41598-023-46860-z