Improved linewidth enhancement factor of 1.3-µm InAs/GaAs quantum dot lasers by direct Si doping

We report on the significantly improved linewidth enhancement factor (αH-factor) of 1.3-µm InAs/GaAs quantum dot (QD) lasers by direct Si doping, compared with ones having identical structures but without the Si doping. It is found that the αH-factors for the ground-state and first excited-state at...

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Main Authors: Ya-Qi Qiu, Zun-Ren Lv, Hong Wang, Hao-Miao Wang, Xiao-Guang Yang, Tao Yang
Format: Article
Language:English
Published: AIP Publishing LLC 2021-05-01
Series:AIP Advances
Online Access:http://dx.doi.org/10.1063/5.0044313
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author Ya-Qi Qiu
Zun-Ren Lv
Hong Wang
Hao-Miao Wang
Xiao-Guang Yang
Tao Yang
author_facet Ya-Qi Qiu
Zun-Ren Lv
Hong Wang
Hao-Miao Wang
Xiao-Guang Yang
Tao Yang
author_sort Ya-Qi Qiu
collection DOAJ
description We report on the significantly improved linewidth enhancement factor (αH-factor) of 1.3-µm InAs/GaAs quantum dot (QD) lasers by direct Si doping, compared with ones having identical structures but without the Si doping. It is found that the αH-factors for the ground-state and first excited-state at their gain peak positions of the Si-doped QD lasers are 1.48 and 0.63 while those of the undoped QD lasers are 2.07 and 1.07, greatly decreasing by about 28.5% and 41.1%, respectively. Furthermore, theoretical calculation and analysis suggest that direct Si doping would increase the electron quasi-Fermi level in conduction, leading to the increase in population inversion. Meanwhile, the appearance of a built-in electric field caused by the Si doping would accelerate the capture of electrons into QDs and strengthen the confinement effect of electrons, resulting in an increased differential gain.
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spelling doaj.art-f20f677ed031436594f7fd7fd3a2b3ff2022-12-21T22:26:32ZengAIP Publishing LLCAIP Advances2158-32262021-05-01115055002055002-510.1063/5.0044313Improved linewidth enhancement factor of 1.3-µm InAs/GaAs quantum dot lasers by direct Si dopingYa-Qi Qiu0Zun-Ren Lv1Hong Wang2Hao-Miao Wang3Xiao-Guang Yang4Tao Yang5Key Laboratory of Semiconductor Materials Science, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, ChinaKey Laboratory of Semiconductor Materials Science, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, ChinaKey Laboratory of Semiconductor Materials Science, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, ChinaKey Laboratory of Semiconductor Materials Science, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, ChinaKey Laboratory of Semiconductor Materials Science, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, ChinaKey Laboratory of Semiconductor Materials Science, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, ChinaWe report on the significantly improved linewidth enhancement factor (αH-factor) of 1.3-µm InAs/GaAs quantum dot (QD) lasers by direct Si doping, compared with ones having identical structures but without the Si doping. It is found that the αH-factors for the ground-state and first excited-state at their gain peak positions of the Si-doped QD lasers are 1.48 and 0.63 while those of the undoped QD lasers are 2.07 and 1.07, greatly decreasing by about 28.5% and 41.1%, respectively. Furthermore, theoretical calculation and analysis suggest that direct Si doping would increase the electron quasi-Fermi level in conduction, leading to the increase in population inversion. Meanwhile, the appearance of a built-in electric field caused by the Si doping would accelerate the capture of electrons into QDs and strengthen the confinement effect of electrons, resulting in an increased differential gain.http://dx.doi.org/10.1063/5.0044313
spellingShingle Ya-Qi Qiu
Zun-Ren Lv
Hong Wang
Hao-Miao Wang
Xiao-Guang Yang
Tao Yang
Improved linewidth enhancement factor of 1.3-µm InAs/GaAs quantum dot lasers by direct Si doping
AIP Advances
title Improved linewidth enhancement factor of 1.3-µm InAs/GaAs quantum dot lasers by direct Si doping
title_full Improved linewidth enhancement factor of 1.3-µm InAs/GaAs quantum dot lasers by direct Si doping
title_fullStr Improved linewidth enhancement factor of 1.3-µm InAs/GaAs quantum dot lasers by direct Si doping
title_full_unstemmed Improved linewidth enhancement factor of 1.3-µm InAs/GaAs quantum dot lasers by direct Si doping
title_short Improved linewidth enhancement factor of 1.3-µm InAs/GaAs quantum dot lasers by direct Si doping
title_sort improved linewidth enhancement factor of 1 3 µm inas gaas quantum dot lasers by direct si doping
url http://dx.doi.org/10.1063/5.0044313
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