Outliers Detection Models in Shewhart Control Charts; an Application in Photolithography: A Semiconductor Manufacturing Industry

Shewhart control charts with estimated control limits are widely used in practice. However, the estimated control limits are often affected by phase-I estimation errors. These estimation errors arise due to variation in the practitioner’s choice of sample size as well as the presence of outlying err...

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Автори: Ishaq Adeyanju Raji, Muhammad Hisyam Lee, Muhammad Riaz, Mu’azu Ramat Abujiya, Nasir Abbas
Формат: Стаття
Мова:English
Опубліковано: MDPI AG 2020-05-01
Серія:Mathematics
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Онлайн доступ:https://www.mdpi.com/2227-7390/8/5/857