Reliability characterization of MEMS switch using MIM test structures
Silicon nitride thin film dielectrics are used in capacitive radio frequency micro-electromechanical systems (MEMS) switches since they provide a low insertion loss, good isolation, and low return loss. The lifetime of these switches is believed to be adversely affected by charge trapping in the sil...
| Main Authors: | , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
SpringerOpen
2014-12-01
|
| Series: | Journal of Electrical Systems and Information Technology |
| Subjects: | |
| Online Access: | http://www.sciencedirect.com/science/article/pii/S2314717214000385 |