Optimization of substrate conformal imprint lithography (SCIL) and etching for nanostructure
The UV-SCIL fabrication process was developed and optimized to improve the quality of the nanostructures on the hard substrate transferred with substrate conformal imprint lithography (SCIL) technology. In particular, the key steps such as coating imprint resist, exposure time and etching time were...
| Main Authors: | , , , |
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| Format: | Article |
| Language: | English |
| Published: |
AIP Publishing LLC
2015-04-01
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| Series: | AIP Advances |
| Online Access: | http://dx.doi.org/10.1063/1.4904061 |