A study of morphology of silicon with femtosecond laser based on phase field model
In this paper, phase field model is employed to simulate the process of femtosecond laser which irradiates on silicon surface. The numerical model is mainly used to study the micro/nano evolution process and the atomic diffusion motion of the system. Meanwhile, the Semi-Implicit Fourier spectral met...
| Main Authors: | , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
IOP Publishing
2022-01-01
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| Series: | Materials Research Express |
| Subjects: | |
| Online Access: | https://doi.org/10.1088/2053-1591/ac7bd9 |