Single flake homo p–n diode of MoTe2 enabled by oxygen plasma doping

Two-dimensional (2D) materials play a crucial role as fundamental electrical components in modern electronics and optoelectronics next-generation artificial intelligent devices. This study presents a methodology for creating a laterally uniform p–n junction by using a partial oxygen plasma-mediated...

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Bibliographic Details
Main Authors: Zulfiqar Irsa, Gul Sania, Sohail Hafiz Aamir, Rabani Iqra, Gul Saima, Rehman Malik Abdul, Wabaidur Saikh Mohammad, Yasir Muhammad, Ullah Inam, Khan Muhammad Asghar, Rehman Shania, Khan Muhammad Farooq
Format: Article
Language:English
Published: De Gruyter 2024-02-01
Series:Nanotechnology Reviews
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Online Access:https://doi.org/10.1515/ntrev-2023-0207
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Summary:Two-dimensional (2D) materials play a crucial role as fundamental electrical components in modern electronics and optoelectronics next-generation artificial intelligent devices. This study presents a methodology for creating a laterally uniform p–n junction by using a partial oxygen plasma-mediated strategy to introduce p-type doping in single channel MoTe2 device. The MoTe2 field effect transistors (FETs) show high electron mobility of about ∼23.54 cm2 V−1 s−1 and a current ON/OFF ratio of ∼106 while p-type FETs show hole mobility of about ∼9.25 cm2 V−1 s−1 and current ON/OFF ratio ∼105 along with artificially created lateral MoTe2 p–n junction, exhibited a rectification ratio of ∼102 and ideality factor of ∼1.7 which is proximity to ideal-like diode. Thus, our study showed a diversity in the development of low-power nanoelectronics of next-generation integrated circuits.
ISSN:2191-9097