EFFECT OF RAPID THERMAL TREATMENT CONDITIONS ON ELECTROPHYSICAL PROPERTIES OF CROMIUM THIN FILMS ON SILICON
Present paper is devoted the determination of the effect of the temperature of the process of rapid thermal treatment of chromium films on n-type conductivity silicon on their resistivity and contact properties of the interface. Chromium films of about 30 nm thickness were deposited by magnetron spu...
| Main Authors: | , |
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| Format: | Article |
| Language: | Russian |
| Published: |
Educational institution «Belarusian State University of Informatics and Radioelectronics»
2019-12-01
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| Series: | Doklady Belorusskogo gosudarstvennogo universiteta informatiki i radioèlektroniki |
| Subjects: | |
| Online Access: | https://doklady.bsuir.by/jour/article/view/2501 |