Temperature and Stress Simulation of 4H-SiC during Laser-Induced Silicidation for Ohmic Contact Generation
We report here on the simulation of temperature and stress evolution of 4H-SiC during laser-induced silicidation to locally generate ohmic contacts between the semiconductor and nickel metallization. The simulation is based on optical free carrier absorption, thermal conduction, and thermal radiatio...
Main Authors: | , |
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Format: | Article |
Language: | English |
Published: |
MDPI AG
2017-12-01
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Series: | Metals |
Subjects: | |
Online Access: | https://www.mdpi.com/2075-4701/7/12/545 |