Temperature and Stress Simulation of 4H-SiC during Laser-Induced Silicidation for Ohmic Contact Generation

We report here on the simulation of temperature and stress evolution of 4H-SiC during laser-induced silicidation to locally generate ohmic contacts between the semiconductor and nickel metallization. The simulation is based on optical free carrier absorption, thermal conduction, and thermal radiatio...

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Bibliographic Details
Main Authors: Benedikt Adelmann, Ralf Hellmann
Format: Article
Language:English
Published: MDPI AG 2017-12-01
Series:Metals
Subjects:
Online Access:https://www.mdpi.com/2075-4701/7/12/545