Machine Learning-Assisted Device Modeling With Process Variations for Advanced Technology
Process variations (PV), including global variation (GV) and local variation (LV), have become one of the major issues in advanced technologies, which is crucial for circuit performance and yield. However, developing a mature and physics-based model is challenging and time-consuming. Thus, in this w...
| Main Authors: | , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
IEEE
2023-01-01
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| Series: | IEEE Journal of the Electron Devices Society |
| Subjects: | |
| Online Access: | https://ieeexplore.ieee.org/document/10129151/ |