Molecular Dynamics Simulation of Silicon Dioxide Etching by Hydrogen Fluoride Using the Reactive Force Field
| Main Authors: | , , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
American Chemical Society
2021-06-01
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| Series: | ACS Omega |
| Online Access: | https://doi.org/10.1021/acsomega.1c01824 |
| _version_ | 1818852304291364864 |
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| author | Dong Hyun Kim Seung Jae Kwak Jae Hun Jeong Suyoung Yoo Sang Ki Nam YongJoo Kim Won Bo Lee |
| author_facet | Dong Hyun Kim Seung Jae Kwak Jae Hun Jeong Suyoung Yoo Sang Ki Nam YongJoo Kim Won Bo Lee |
| author_sort | Dong Hyun Kim |
| collection | DOAJ |
| first_indexed | 2024-12-19T07:18:47Z |
| format | Article |
| id | doaj.art-f58e8f7025e0435f8cf07cfa3a7e4ec4 |
| institution | Directory Open Access Journal |
| issn | 2470-1343 |
| language | English |
| last_indexed | 2024-12-19T07:18:47Z |
| publishDate | 2021-06-01 |
| publisher | American Chemical Society |
| record_format | Article |
| series | ACS Omega |
| spelling | doaj.art-f58e8f7025e0435f8cf07cfa3a7e4ec42022-12-21T20:30:59ZengAmerican Chemical SocietyACS Omega2470-13432021-06-01624160091601510.1021/acsomega.1c01824Molecular Dynamics Simulation of Silicon Dioxide Etching by Hydrogen Fluoride Using the Reactive Force FieldDong Hyun Kim0Seung Jae Kwak1Jae Hun Jeong2Suyoung Yoo3Sang Ki Nam4YongJoo Kim5Won Bo Lee6School of Chemical and Biological Engineering, Institute of Chemical Processes, Seoul National University, Seoul, Republic of KoreaSchool of Chemical and Biological Engineering, Institute of Chemical Processes, Seoul National University, Seoul, Republic of KoreaSchool of Chemical and Biological Engineering, Institute of Chemical Processes, Seoul National University, Seoul, Republic of KoreaSamsung Electronics, Hwaseong, Gyeonggi, Republic of KoreaSamsung Electronics, Hwaseong, Gyeonggi, Republic of KoreaSchool of Advanced Materials Engineering, Kookmin University, Seoul, Republic of KoreaSchool of Chemical and Biological Engineering, Institute of Chemical Processes, Seoul National University, Seoul, Republic of Koreahttps://doi.org/10.1021/acsomega.1c01824 |
| spellingShingle | Dong Hyun Kim Seung Jae Kwak Jae Hun Jeong Suyoung Yoo Sang Ki Nam YongJoo Kim Won Bo Lee Molecular Dynamics Simulation of Silicon Dioxide Etching by Hydrogen Fluoride Using the Reactive Force Field ACS Omega |
| title | Molecular Dynamics Simulation of Silicon Dioxide Etching by Hydrogen Fluoride Using the Reactive Force Field |
| title_full | Molecular Dynamics Simulation of Silicon Dioxide Etching by Hydrogen Fluoride Using the Reactive Force Field |
| title_fullStr | Molecular Dynamics Simulation of Silicon Dioxide Etching by Hydrogen Fluoride Using the Reactive Force Field |
| title_full_unstemmed | Molecular Dynamics Simulation of Silicon Dioxide Etching by Hydrogen Fluoride Using the Reactive Force Field |
| title_short | Molecular Dynamics Simulation of Silicon Dioxide Etching by Hydrogen Fluoride Using the Reactive Force Field |
| title_sort | molecular dynamics simulation of silicon dioxide etching by hydrogen fluoride using the reactive force field |
| url | https://doi.org/10.1021/acsomega.1c01824 |
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