Investigating the simultaneous effect of bias voltage and annealing on structural and optical properties of ZnO layer prepared by RF magnetron sputtering

Investigating the simultaneous effect of bias voltage and annealing on structural and optical properties of ZnO layer prepared by RF magnetron sputtering

In this study, the effects of different bias voltages (0, −100, −200 V) with an annealing temperature of 450 °C have been investigated on the structural and optical properties of zinc oxide (ZnO) thin film as a transparent conductive oxide (TCO) deposited by radio frequency (RF) magnetron sputtering...

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Bibliographic Details
Main Authors: Mohammad-Reza Zamani-Meymian, Razieh Keshtmand, Marzieh Yazdanshenas, Milad Fallah
Format: Article
Language:English
Published: Elsevier 2024-02-01
Series:Results in Optics
Subjects:
ZnO
Bias
Annealing
Thin Film
Sputtering
Deposition
Online Access:http://www.sciencedirect.com/science/article/pii/S2666950124000063

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http://www.sciencedirect.com/science/article/pii/S2666950124000063

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