Fabrication characteristics of a line-and-space pattern and a dot pattern on a roll mold by using electron-beam lithography

Fabrication characteristics of a line-and-space pattern and a dot pattern on a roll mold by using electron-beam lithography

Roll-to-roll nanoimprint lithography (RTR-NIL) has received considerable attention because it permits large-area nanopatterning with both high resolution and high throughput. However, the application of RTR-NIL is restricted by difficulties in fabricating nanoscale roll molds. Seamless roll molds ar...

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Bibliographic Details
Main Authors: Kai OJIMA, Masashi SAITO, Noriyuki UNNO, Jun TANIGUCHI
Format: Article
Language:English
Published: The Japan Society of Mechanical Engineers 2016-09-01
Series:Journal of Advanced Mechanical Design, Systems, and Manufacturing
Subjects:
roll-to-roll nanoimprint
nanoimprint lithography
roll mold
electron-beam lithography
line-and-space pattern
dot pattern
Online Access:https://www.jstage.jst.go.jp/article/jamdsm/10/5/10_2016jamdsm0074/_pdf/-char/en

Internet

https://www.jstage.jst.go.jp/article/jamdsm/10/5/10_2016jamdsm0074/_pdf/-char/en

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