High aspect ratio slanted grating replication process with low residual layer thickness
Slanted subwavelength gra2ngs are used today in various products, especially as TIR couplers in Augmented Reality (AR) waveguides. Nano-Imprint Lithography (NIL) has been successfully used as a produc2on technique for such gra2ngs with periods down to 250nm, slants up to 45 degrees and aspect ra2o u...
| Main Authors: | , |
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| Format: | Article |
| Language: | English |
| Published: |
EDP Sciences
2023-01-01
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| Series: | EPJ Web of Conferences |
| Online Access: | https://www.epj-conferences.org/articles/epjconf/pdf/2023/13/epjconf_eosam2023_04030.pdf |