Inert-Atmosphere Microfabrication Technology for 2D Materials and Heterostructures
Most 2D materials are unstable under ambient conditions. Assembly of van der Waals heterostructures in the inert atmosphere of the glove box with ex situ lithography partially solves the problem of device fabrication out of unstable materials. In our paper, we demonstrate an approach to the next-gen...
| Main Authors: | , , , , , , |
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| Format: | Article |
| Language: | English |
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MDPI AG
2023-12-01
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| Series: | Micromachines |
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| Online Access: | https://www.mdpi.com/2072-666X/15/1/94 |
| _version_ | 1797342969419792384 |
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| author | Aliaksandr Duleba Mikhail Pugachev Mark Blumenau Sergey Martanov Mark Naumov Aleksey Shupletsov Aleksandr Kuntsevich |
| author_facet | Aliaksandr Duleba Mikhail Pugachev Mark Blumenau Sergey Martanov Mark Naumov Aleksey Shupletsov Aleksandr Kuntsevich |
| author_sort | Aliaksandr Duleba |
| collection | DOAJ |
| description | Most 2D materials are unstable under ambient conditions. Assembly of van der Waals heterostructures in the inert atmosphere of the glove box with ex situ lithography partially solves the problem of device fabrication out of unstable materials. In our paper, we demonstrate an approach to the next-generation inert-atmosphere (nitrogen, <20 ppm oxygen content) fabrication setup, including optical contact mask lithography with a 2 <inline-formula><math xmlns="http://www.w3.org/1998/Math/MathML" display="inline"><semantics><mi mathvariant="sans-serif">μ</mi></semantics></math></inline-formula>m resolution, metal evaporation, lift-off and placement of the sample to the cryostat for electric measurements in the same inert atmosphere environment. We consider basic construction principles, budget considerations, and showcase the fabrication and subsequent degradation of black-phosphorous-based structures within weeks. The proposed solutions are surprisingly compact and inexpensive, making them feasible for implementation in numerous 2D materials laboratories. |
| first_indexed | 2024-03-08T10:40:53Z |
| format | Article |
| id | doaj.art-f74f5f49d07d489c8bab6a6a8a6dd9d7 |
| institution | Directory Open Access Journal |
| issn | 2072-666X |
| language | English |
| last_indexed | 2024-03-08T10:40:53Z |
| publishDate | 2023-12-01 |
| publisher | MDPI AG |
| record_format | Article |
| series | Micromachines |
| spelling | doaj.art-f74f5f49d07d489c8bab6a6a8a6dd9d72024-01-26T17:44:29ZengMDPI AGMicromachines2072-666X2023-12-011519410.3390/mi15010094Inert-Atmosphere Microfabrication Technology for 2D Materials and HeterostructuresAliaksandr Duleba0Mikhail Pugachev1Mark Blumenau2Sergey Martanov3Mark Naumov4Aleksey Shupletsov5Aleksandr Kuntsevich6P.N. Lebedev Physical Institute of the Russian Academy of Sciences, Moscow 119991, RussiaP.N. Lebedev Physical Institute of the Russian Academy of Sciences, Moscow 119991, RussiaP.N. Lebedev Physical Institute of the Russian Academy of Sciences, Moscow 119991, RussiaP.N. Lebedev Physical Institute of the Russian Academy of Sciences, Moscow 119991, RussiaDukhov Research Institute of Automatics (VNIIA), Moscow 127055, RussiaP.N. Lebedev Physical Institute of the Russian Academy of Sciences, Moscow 119991, RussiaP.N. Lebedev Physical Institute of the Russian Academy of Sciences, Moscow 119991, RussiaMost 2D materials are unstable under ambient conditions. Assembly of van der Waals heterostructures in the inert atmosphere of the glove box with ex situ lithography partially solves the problem of device fabrication out of unstable materials. In our paper, we demonstrate an approach to the next-generation inert-atmosphere (nitrogen, <20 ppm oxygen content) fabrication setup, including optical contact mask lithography with a 2 <inline-formula><math xmlns="http://www.w3.org/1998/Math/MathML" display="inline"><semantics><mi mathvariant="sans-serif">μ</mi></semantics></math></inline-formula>m resolution, metal evaporation, lift-off and placement of the sample to the cryostat for electric measurements in the same inert atmosphere environment. We consider basic construction principles, budget considerations, and showcase the fabrication and subsequent degradation of black-phosphorous-based structures within weeks. The proposed solutions are surprisingly compact and inexpensive, making them feasible for implementation in numerous 2D materials laboratories.https://www.mdpi.com/2072-666X/15/1/94van der Waals heterostructures2D materialslithographynanofabricationmetal films |
| spellingShingle | Aliaksandr Duleba Mikhail Pugachev Mark Blumenau Sergey Martanov Mark Naumov Aleksey Shupletsov Aleksandr Kuntsevich Inert-Atmosphere Microfabrication Technology for 2D Materials and Heterostructures Micromachines van der Waals heterostructures 2D materials lithography nanofabrication metal films |
| title | Inert-Atmosphere Microfabrication Technology for 2D Materials and Heterostructures |
| title_full | Inert-Atmosphere Microfabrication Technology for 2D Materials and Heterostructures |
| title_fullStr | Inert-Atmosphere Microfabrication Technology for 2D Materials and Heterostructures |
| title_full_unstemmed | Inert-Atmosphere Microfabrication Technology for 2D Materials and Heterostructures |
| title_short | Inert-Atmosphere Microfabrication Technology for 2D Materials and Heterostructures |
| title_sort | inert atmosphere microfabrication technology for 2d materials and heterostructures |
| topic | van der Waals heterostructures 2D materials lithography nanofabrication metal films |
| url | https://www.mdpi.com/2072-666X/15/1/94 |
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