Impact of Atomic Layer Deposition to NanoPhotonic Structures and Devices: A Review

Impact of Atomic Layer Deposition to NanoPhotonic Structures and Devices: A Review

We review the significance of optical thin films by Atomic Layer Deposition (ALD) method to fabricate nanophotonic devices and structures. ALD is a versatile technique to deposit functional coatings on reactive surfaces with conformal growth of compound materials, precise thickness control capable o...

Full description

Bibliographic Details
Main Authors: Muhammad Rizwan eSaleem, Rizwan eAli, Mohammad Bilal eKhan, Jari eTurunen, Seppo eHonkanen
Format: Article
Language:English
Published: Frontiers Media S.A. 2014-10-01
Series:Frontiers in Materials
Subjects:
nanophotonics
Plasmonics
Atomic layer deposition
optical materials
nano-optical devices
Online Access:http://journal.frontiersin.org/Journal/10.3389/fmats.2014.00018/full

Internet

http://journal.frontiersin.org/Journal/10.3389/fmats.2014.00018/full

Similar Items