Impact of Atomic Layer Deposition to NanoPhotonic Structures and Devices: A Review
We review the significance of optical thin films by Atomic Layer Deposition (ALD) method to fabricate nanophotonic devices and structures. ALD is a versatile technique to deposit functional coatings on reactive surfaces with conformal growth of compound materials, precise thickness control capable o...
| Main Authors: | , , , , |
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| Format: | Article |
| Language: | English |
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Frontiers Media S.A.
2014-10-01
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| Series: | Frontiers in Materials |
| Subjects: | |
| Online Access: | http://journal.frontiersin.org/Journal/10.3389/fmats.2014.00018/full |
| _version_ | 1819075987824967680 |
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| author | Muhammad Rizwan eSaleem Muhammad Rizwan eSaleem Rizwan eAli Mohammad Bilal eKhan Jari eTurunen Seppo eHonkanen |
| author_facet | Muhammad Rizwan eSaleem Muhammad Rizwan eSaleem Rizwan eAli Mohammad Bilal eKhan Jari eTurunen Seppo eHonkanen |
| author_sort | Muhammad Rizwan eSaleem |
| collection | DOAJ |
| description | We review the significance of optical thin films by Atomic Layer Deposition (ALD) method to fabricate nanophotonic devices and structures. ALD is a versatile technique to deposit functional coatings on reactive surfaces with conformal growth of compound materials, precise thickness control capable of angstrom resolution and coverage of high aspect ratio nanostructures using wide range of materials. ALD has explored great potential in the emerging fields of photonics, plasmonics, nano-biotechnology, and microelectronics. ALD technique uses sequential reactive chemical reactions to saturate a surface with a monolayer by pulsing of a first precursor (metal alkoxides or covalent halides), followed by reaction with second precursor molecules such as water to form the desired compound coatings. The targeted thickness of the desired compound material is controlled by the number of ALD cycles of precursor molecules that ensures the self limiting nature of reactions. The conformal growth and filling of TiO2 and Al2O3 optical material on nanostructures and their resulting optical properties have been described. The low temperature ALD-growth on various replicated sub-wavelength polymeric gratings is discussed. |
| first_indexed | 2024-12-21T18:34:09Z |
| format | Article |
| id | doaj.art-f7ec32b41bd94c278364e5e09cbde62b |
| institution | Directory Open Access Journal |
| issn | 2296-8016 |
| language | English |
| last_indexed | 2024-12-21T18:34:09Z |
| publishDate | 2014-10-01 |
| publisher | Frontiers Media S.A. |
| record_format | Article |
| series | Frontiers in Materials |
| spelling | doaj.art-f7ec32b41bd94c278364e5e09cbde62b2022-12-21T18:54:11ZengFrontiers Media S.A.Frontiers in Materials2296-80162014-10-01110.3389/fmats.2014.00018113306Impact of Atomic Layer Deposition to NanoPhotonic Structures and Devices: A ReviewMuhammad Rizwan eSaleem0Muhammad Rizwan eSaleem1Rizwan eAli2Mohammad Bilal eKhan3Jari eTurunen4Seppo eHonkanen5University of Eastern FinlandNational University of Sciences and Technology (NUST)University of Eastern FinlandNational University of Sciences and Technology (NUST)University of Eastern FinlandUniversity of Eastern FinlandWe review the significance of optical thin films by Atomic Layer Deposition (ALD) method to fabricate nanophotonic devices and structures. ALD is a versatile technique to deposit functional coatings on reactive surfaces with conformal growth of compound materials, precise thickness control capable of angstrom resolution and coverage of high aspect ratio nanostructures using wide range of materials. ALD has explored great potential in the emerging fields of photonics, plasmonics, nano-biotechnology, and microelectronics. ALD technique uses sequential reactive chemical reactions to saturate a surface with a monolayer by pulsing of a first precursor (metal alkoxides or covalent halides), followed by reaction with second precursor molecules such as water to form the desired compound coatings. The targeted thickness of the desired compound material is controlled by the number of ALD cycles of precursor molecules that ensures the self limiting nature of reactions. The conformal growth and filling of TiO2 and Al2O3 optical material on nanostructures and their resulting optical properties have been described. The low temperature ALD-growth on various replicated sub-wavelength polymeric gratings is discussed.http://journal.frontiersin.org/Journal/10.3389/fmats.2014.00018/fullnanophotonicsPlasmonicsAtomic layer depositionoptical materialsnano-optical devices |
| spellingShingle | Muhammad Rizwan eSaleem Muhammad Rizwan eSaleem Rizwan eAli Mohammad Bilal eKhan Jari eTurunen Seppo eHonkanen Impact of Atomic Layer Deposition to NanoPhotonic Structures and Devices: A Review Frontiers in Materials nanophotonics Plasmonics Atomic layer deposition optical materials nano-optical devices |
| title | Impact of Atomic Layer Deposition to NanoPhotonic Structures and Devices: A Review |
| title_full | Impact of Atomic Layer Deposition to NanoPhotonic Structures and Devices: A Review |
| title_fullStr | Impact of Atomic Layer Deposition to NanoPhotonic Structures and Devices: A Review |
| title_full_unstemmed | Impact of Atomic Layer Deposition to NanoPhotonic Structures and Devices: A Review |
| title_short | Impact of Atomic Layer Deposition to NanoPhotonic Structures and Devices: A Review |
| title_sort | impact of atomic layer deposition to nanophotonic structures and devices a review |
| topic | nanophotonics Plasmonics Atomic layer deposition optical materials nano-optical devices |
| url | http://journal.frontiersin.org/Journal/10.3389/fmats.2014.00018/full |
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