Nano-patterning on multilayer MoS2 via block copolymer lithography for highly sensitive and responsive phototransistors
Thin-film phototransistors based on multilayer MoS2 are of great technological importance, but their photoresponsivity may be hindered by an indirect bandgap. Here, nano-patterning of multilayer MoS2 overcomes this limitation by inducing trap states within the bandgap, resulting in a high photorespo...
| Main Authors: | , , , , , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Nature Portfolio
2021-09-01
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| Series: | Communications Materials |
| Online Access: | https://doi.org/10.1038/s43246-021-00197-0 |