Prediction of Surface Roughness as a Function of Temperature for SiO<sub>2</sub> Thin-Film in PECVD Process

Prediction of Surface Roughness as a Function of Temperature for SiO<sub>2</sub> Thin-Film in PECVD Process

An analytical model to predict the surface roughness for the plasma-enhanced chemical vapor deposition (PECVD) process over a large range of temperature values is still nonexistent. By using an existing prediction model, the surface roughness can directly be calculated instead of repeating the exper...

Full description

Bibliographic Details
Main Authors: Muhammad Rizwan Amirzada, Yousuf Khan, Muhammad Khurram Ehsan, Atiq Ur Rehman, Abdul Aleem Jamali, Abdul Rafay Khatri
Format: Article
Language:English
Published: MDPI AG 2022-02-01
Series:Micromachines
Subjects:
surface roughness
PECVD process
SiO<sub>2</sub> thin-films
analytical prediction
MEMS
micro-mirrors
Online Access:https://www.mdpi.com/2072-666X/13/2/314

Internet

https://www.mdpi.com/2072-666X/13/2/314

Similar Items