Prediction of Surface Roughness as a Function of Temperature for SiO<sub>2</sub> Thin-Film in PECVD Process

Prediction of Surface Roughness as a Function of Temperature for SiO<sub>2</sub> Thin-Film in PECVD Process

An analytical model to predict the surface roughness for the plasma-enhanced chemical vapor deposition (PECVD) process over a large range of temperature values is still nonexistent. By using an existing prediction model, the surface roughness can directly be calculated instead of repeating the exper...

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Bibliographic Details
Main Authors:	Muhammad Rizwan Amirzada, Yousuf Khan, Muhammad Khurram Ehsan, Atiq Ur Rehman, Abdul Aleem Jamali, Abdul Rafay Khatri
Format:	Article
Language:	English
Published:	MDPI AG 2022-02-01
Series:	Micromachines
Subjects:	surface roughness PECVD process SiO<sub>2</sub> thin-films analytical prediction MEMS micro-mirrors
Online Access:	https://www.mdpi.com/2072-666X/13/2/314

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