Epitaxial lateral overgrowth of α-Ga2O3 by halide vapor phase epitaxy

We demonstrate the epitaxial lateral overgrowth of α-Ga2O3 by halide vapor phase epitaxy. We prepared patterned SiO2 masks on a (0001) α-Ga2O3/sapphire template, and then α-Ga2O3 islands were regrown selectively on the mask windows. The islands grew vertically and laterally to coalesce with each oth...

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Bibliographic Details
Main Authors: Y. Oshima, K. Kawara, T. Shinohe, T. Hitora, M. Kasu, S. Fujita
Format: Article
Language:English
Published: AIP Publishing LLC 2019-02-01
Series:APL Materials
Online Access:http://dx.doi.org/10.1063/1.5051058