Increasing the stability of DNA nanostructure templates by atomic layer deposition of Al2O3 and its application in imprinting lithography

Increasing the stability of DNA nanostructure templates by atomic layer deposition of Al2O3 and its application in imprinting lithography

We present a method to increase the stability of DNA nanostructure templates through conformal coating with a nanometer-thin protective inorganic oxide layer created using atomic layer deposition (ALD). DNA nanotubes and origami triangles were coated with ca. 2 nm to ca. 20 nm of Al2O3. Nanoscale fe...

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Bibliographic Details
Main Authors: Hyojeong Kim, Kristin Arbutina, Anqin Xu, Haitao Liu
Format: Article
Language:English
Published: Beilstein-Institut 2017-11-01
Series:Beilstein Journal of Nanotechnology
Subjects:
aluminium oxide (Al2O3)
atomic layer deposition
DNA nanostructure
nanofabrication
nanoimprint lithography
pattern transfer
polymer stamp
replica molding
Online Access:https://doi.org/10.3762/bjnano.8.236

Internet

https://doi.org/10.3762/bjnano.8.236

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