Dislocation-related leakage-current paths of 4H silicon carbide

Improving the quality of 4H silicon carbide (4H-SiC) epitaxial layers to reduce the leakage current of 4H-SiC based high-power devices is a long-standing issue in the development of 4H-SiC homoepitaxy. In this work, we compare the effect of different type of dislocations, and discriminate the effect...

Πλήρης περιγραφή

Λεπτομέρειες βιβλιογραφικής εγγραφής
Κύριοι συγγραφείς: Wandong Gao, Guang Yang, Yixiao Qian, Xuefeng Han, Can Cui, Xiaodong Pi, Deren Yang, Rong Wang
Μορφή: Άρθρο
Γλώσσα:English
Έκδοση: Frontiers Media S.A. 2023-01-01
Σειρά:Frontiers in Materials
Θέματα:
Διαθέσιμο Online:https://www.frontiersin.org/articles/10.3389/fmats.2023.1022878/full