1T Capacitor-Less DRAM Cell Based on Asymmetric Tunnel FET Design

In this work we propose and demonstrate the use of a Tunnel FET (TFET) as capacitorless DRAM cell based on TCAD simulations and experiments. We report more experimental results on Tunnel FETs implemented as a double-gate (DG) fully-depleted Silicon-On-Insulator (FD-SOI) devices. The Tunnel FET based...

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Main Authors: Arnab Biswas, Adrian M. Ionescu
Format: Article
Language:English
Published: IEEE 2015-01-01
Series:IEEE Journal of the Electron Devices Society
Subjects:
Online Access:https://ieeexplore.ieee.org/document/6990484/
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author Arnab Biswas
Adrian M. Ionescu
author_facet Arnab Biswas
Adrian M. Ionescu
author_sort Arnab Biswas
collection DOAJ
description In this work we propose and demonstrate the use of a Tunnel FET (TFET) as capacitorless DRAM cell based on TCAD simulations and experiments. We report more experimental results on Tunnel FETs implemented as a double-gate (DG) fully-depleted Silicon-On-Insulator (FD-SOI) devices. The Tunnel FET based DRAM cell has an asymmetric body and a partial overlap of the top gate (L<sub>G1</sub>) with a total overlap of the back gate over the channel region (L<sub>G2</sub>). A potential well is created by biasing the back gate (V<sub>G2</sub>) in accumulation while the front gate (V<sub>G1</sub>) is in inversion. Holes from the p+ source are injected by the forward-biased source/channel junction and stored in the electrically induced potential well. Programming conditions and related transients are reported and the role of temperature is investigated.
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spelling doaj.art-fbeddc7871ef4b11afcd34e408f61a232022-12-21T23:00:54ZengIEEEIEEE Journal of the Electron Devices Society2168-67342015-01-013321722210.1109/JEDS.2014.238275969904841T Capacitor-Less DRAM Cell Based on Asymmetric Tunnel FET DesignArnab Biswas0Adrian M. Ionescu1Nanolab, Ecole Polytechnique Fédérale de Lausanne, Lausanne, SwitzerlandNanolab, Ecole Polytechnique Fédérale de Lausanne, Lausanne, SwitzerlandIn this work we propose and demonstrate the use of a Tunnel FET (TFET) as capacitorless DRAM cell based on TCAD simulations and experiments. We report more experimental results on Tunnel FETs implemented as a double-gate (DG) fully-depleted Silicon-On-Insulator (FD-SOI) devices. The Tunnel FET based DRAM cell has an asymmetric body and a partial overlap of the top gate (L<sub>G1</sub>) with a total overlap of the back gate over the channel region (L<sub>G2</sub>). A potential well is created by biasing the back gate (V<sub>G2</sub>) in accumulation while the front gate (V<sub>G1</sub>) is in inversion. Holes from the p+ source are injected by the forward-biased source/channel junction and stored in the electrically induced potential well. Programming conditions and related transients are reported and the role of temperature is investigated.https://ieeexplore.ieee.org/document/6990484/Tunnel FETDRAMCapacitorless memory1T/0C
spellingShingle Arnab Biswas
Adrian M. Ionescu
1T Capacitor-Less DRAM Cell Based on Asymmetric Tunnel FET Design
IEEE Journal of the Electron Devices Society
Tunnel FET
DRAM
Capacitorless memory
1T/0C
title 1T Capacitor-Less DRAM Cell Based on Asymmetric Tunnel FET Design
title_full 1T Capacitor-Less DRAM Cell Based on Asymmetric Tunnel FET Design
title_fullStr 1T Capacitor-Less DRAM Cell Based on Asymmetric Tunnel FET Design
title_full_unstemmed 1T Capacitor-Less DRAM Cell Based on Asymmetric Tunnel FET Design
title_short 1T Capacitor-Less DRAM Cell Based on Asymmetric Tunnel FET Design
title_sort 1t capacitor less dram cell based on asymmetric tunnel fet design
topic Tunnel FET
DRAM
Capacitorless memory
1T/0C
url https://ieeexplore.ieee.org/document/6990484/
work_keys_str_mv AT arnabbiswas 1tcapacitorlessdramcellbasedonasymmetrictunnelfetdesign
AT adrianmionescu 1tcapacitorlessdramcellbasedonasymmetrictunnelfetdesign