Gate‐tunable Thermoelectric Effect in Oxide Thin Films at Room Temperature

Abstract Over the past several decades, major efforts have been directed toward the optimization of carrier concentrations to maximize thermoelectric performance. Chemical doping is an effective way to control carriers, but electrostatic gating provides a continuous tuning knob that enables effectiv...

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Main Authors: Arindom Chatterjee, Carlos Nunez Lobato, Victor Rosendal, Thomas Aarøe Anhøj, Jean‐Claude Grivel, Felix Trier, Dennis Valbjørn Christensen, Nini Pryds
Format: Article
Language:English
Published: Wiley-VCH 2024-03-01
Series:Advanced Electronic Materials
Subjects:
Online Access:https://doi.org/10.1002/aelm.202300683
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author Arindom Chatterjee
Carlos Nunez Lobato
Victor Rosendal
Thomas Aarøe Anhøj
Jean‐Claude Grivel
Felix Trier
Dennis Valbjørn Christensen
Nini Pryds
author_facet Arindom Chatterjee
Carlos Nunez Lobato
Victor Rosendal
Thomas Aarøe Anhøj
Jean‐Claude Grivel
Felix Trier
Dennis Valbjørn Christensen
Nini Pryds
author_sort Arindom Chatterjee
collection DOAJ
description Abstract Over the past several decades, major efforts have been directed toward the optimization of carrier concentrations to maximize thermoelectric performance. Chemical doping is an effective way to control carriers, but electrostatic gating provides a continuous tuning knob that enables effective and dynamic changes to the carrier density. Here, a method is reported that uses an electric‐double‐layer (EDL) transistor‐based ionic liquids gating to adjust the thermoelectric properties of thin films made from Nb‐doped SrTiO3 (Nb‐STO). This technique allows us to effectively change these properties at room temperature by varying the concentration of charge carriers within a broad range. A combination of lower film thickness and intrinsic carrier concentration leads to an enhanced ionic liquid‐gated response, resulting in an 18‐fold enhancement in power factor at room temperature for a 14 nm thin 4% Nb‐STO film at gate voltages within ±3.0 V. The present study offers new insights and strategies toward enhanced gate tunable thermoelectric properties in thin films.
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spelling doaj.art-fc8dbadf311e4250be02cf2e9aa1e3f62024-03-07T15:46:04ZengWiley-VCHAdvanced Electronic Materials2199-160X2024-03-01103n/an/a10.1002/aelm.202300683Gate‐tunable Thermoelectric Effect in Oxide Thin Films at Room TemperatureArindom Chatterjee0Carlos Nunez Lobato1Victor Rosendal2Thomas Aarøe Anhøj3Jean‐Claude Grivel4Felix Trier5Dennis Valbjørn Christensen6Nini Pryds7Department of Energy Conversion and Storage DTU Nanolab Technical University of Denmark Lyngby Kongens 2800 DenmarkDepartment of Energy Conversion and Storage DTU Nanolab Technical University of Denmark Lyngby Kongens 2800 DenmarkDepartment of Energy Conversion and Storage DTU Nanolab Technical University of Denmark Lyngby Kongens 2800 DenmarkDepartment of Energy Conversion and Storage DTU Nanolab Technical University of Denmark Lyngby Kongens 2800 DenmarkDepartment of Energy Conversion and Storage DTU Nanolab Technical University of Denmark Lyngby Kongens 2800 DenmarkDepartment of Energy Conversion and Storage DTU Nanolab Technical University of Denmark Lyngby Kongens 2800 DenmarkDepartment of Energy Conversion and Storage DTU Nanolab Technical University of Denmark Lyngby Kongens 2800 DenmarkDepartment of Energy Conversion and Storage DTU Nanolab Technical University of Denmark Lyngby Kongens 2800 DenmarkAbstract Over the past several decades, major efforts have been directed toward the optimization of carrier concentrations to maximize thermoelectric performance. Chemical doping is an effective way to control carriers, but electrostatic gating provides a continuous tuning knob that enables effective and dynamic changes to the carrier density. Here, a method is reported that uses an electric‐double‐layer (EDL) transistor‐based ionic liquids gating to adjust the thermoelectric properties of thin films made from Nb‐doped SrTiO3 (Nb‐STO). This technique allows us to effectively change these properties at room temperature by varying the concentration of charge carriers within a broad range. A combination of lower film thickness and intrinsic carrier concentration leads to an enhanced ionic liquid‐gated response, resulting in an 18‐fold enhancement in power factor at room temperature for a 14 nm thin 4% Nb‐STO film at gate voltages within ±3.0 V. The present study offers new insights and strategies toward enhanced gate tunable thermoelectric properties in thin films.https://doi.org/10.1002/aelm.202300683and thermoelectric power factorelectric‐double‐layer transistorsionic liquid gatingNb‐doped SrTiO3 thin films
spellingShingle Arindom Chatterjee
Carlos Nunez Lobato
Victor Rosendal
Thomas Aarøe Anhøj
Jean‐Claude Grivel
Felix Trier
Dennis Valbjørn Christensen
Nini Pryds
Gate‐tunable Thermoelectric Effect in Oxide Thin Films at Room Temperature
Advanced Electronic Materials
and thermoelectric power factor
electric‐double‐layer transistors
ionic liquid gating
Nb‐doped SrTiO3 thin films
title Gate‐tunable Thermoelectric Effect in Oxide Thin Films at Room Temperature
title_full Gate‐tunable Thermoelectric Effect in Oxide Thin Films at Room Temperature
title_fullStr Gate‐tunable Thermoelectric Effect in Oxide Thin Films at Room Temperature
title_full_unstemmed Gate‐tunable Thermoelectric Effect in Oxide Thin Films at Room Temperature
title_short Gate‐tunable Thermoelectric Effect in Oxide Thin Films at Room Temperature
title_sort gate tunable thermoelectric effect in oxide thin films at room temperature
topic and thermoelectric power factor
electric‐double‐layer transistors
ionic liquid gating
Nb‐doped SrTiO3 thin films
url https://doi.org/10.1002/aelm.202300683
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