Enhanced process stability for the low temperature sputter deposition of aluminium nitride thin films

Enhanced process stability for the low temperature sputter deposition of aluminium nitride thin films

MEMS (micro electro-mechanical systems) operated in resonance and excited piezoelectrically are nowadays used for a broad range of different application scenarios. To enhance the process stability and hence, the reproducibility of key film parameters of sputter-deposited aluminium nitride such as th...

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Bibliographic Details
Main Authors: M Fischeneder, A Bittner, M Schneider, U Schmid
Format: Article
Language:English
Published: IOP Publishing 2018-01-01
Series:Materials Research Express
Subjects:
d33
leakage current
piezoelectric coefficient
AlN
thin film deposition
clamped substrate holder
Online Access:https://doi.org/10.1088/2053-1591/aac9db

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