Accelerating the oxidation rate of AlN substrate through the addition of water vapor
To apply a pre-oxidation treatment on aluminum nitride (AlN) substrate is a common practice before its metallization. In the present study, the microstructure of AlN after oxidation either in dry air or in wet air is characterized. The resulting thermal conductivity is measured. With or without the...
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Format: | Article |
Language: | English |
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Taylor & Francis Group
2017-12-01
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Series: | Journal of Asian Ceramic Societies |
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Online Access: | http://www.sciencedirect.com/science/article/pii/S2187076417300076 |
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author | Chun-Ting Yeh Wei-Hsing Tuan |
author_facet | Chun-Ting Yeh Wei-Hsing Tuan |
author_sort | Chun-Ting Yeh |
collection | DOAJ |
description | To apply a pre-oxidation treatment on aluminum nitride (AlN) substrate is a common practice before its metallization. In the present study, the microstructure of AlN after oxidation either in dry air or in wet air is characterized. The resulting thermal conductivity is measured. With or without the presence of water vapor, the oxidation of AlN is a reaction-dominating process. The addition of water vapor speeds up the oxidation rate by one order of magnitude. The surface oxide layer is full of nano-sized pores. The presence of surface oxide reduces the thermal conductivity by ∼15% when the thickness of oxide layer is only 3 μm. |
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format | Article |
id | doaj.art-fd732100d6874495bbf09fdc05a23b08 |
institution | Directory Open Access Journal |
issn | 2187-0764 |
language | English |
last_indexed | 2024-12-22T05:07:10Z |
publishDate | 2017-12-01 |
publisher | Taylor & Francis Group |
record_format | Article |
series | Journal of Asian Ceramic Societies |
spelling | doaj.art-fd732100d6874495bbf09fdc05a23b082022-12-21T18:38:04ZengTaylor & Francis GroupJournal of Asian Ceramic Societies2187-07642017-12-015438138410.1016/j.jascer.2017.08.001Accelerating the oxidation rate of AlN substrate through the addition of water vaporChun-Ting YehWei-Hsing TuanTo apply a pre-oxidation treatment on aluminum nitride (AlN) substrate is a common practice before its metallization. In the present study, the microstructure of AlN after oxidation either in dry air or in wet air is characterized. The resulting thermal conductivity is measured. With or without the presence of water vapor, the oxidation of AlN is a reaction-dominating process. The addition of water vapor speeds up the oxidation rate by one order of magnitude. The surface oxide layer is full of nano-sized pores. The presence of surface oxide reduces the thermal conductivity by ∼15% when the thickness of oxide layer is only 3 μm.http://www.sciencedirect.com/science/article/pii/S2187076417300076Aluminum nitrideOxidationThermal conductivityMicrostructure |
spellingShingle | Chun-Ting Yeh Wei-Hsing Tuan Accelerating the oxidation rate of AlN substrate through the addition of water vapor Journal of Asian Ceramic Societies Aluminum nitride Oxidation Thermal conductivity Microstructure |
title | Accelerating the oxidation rate of AlN substrate through the addition of water vapor |
title_full | Accelerating the oxidation rate of AlN substrate through the addition of water vapor |
title_fullStr | Accelerating the oxidation rate of AlN substrate through the addition of water vapor |
title_full_unstemmed | Accelerating the oxidation rate of AlN substrate through the addition of water vapor |
title_short | Accelerating the oxidation rate of AlN substrate through the addition of water vapor |
title_sort | accelerating the oxidation rate of aln substrate through the addition of water vapor |
topic | Aluminum nitride Oxidation Thermal conductivity Microstructure |
url | http://www.sciencedirect.com/science/article/pii/S2187076417300076 |
work_keys_str_mv | AT chuntingyeh acceleratingtheoxidationrateofalnsubstratethroughtheadditionofwatervapor AT weihsingtuan acceleratingtheoxidationrateofalnsubstratethroughtheadditionofwatervapor |