Accelerating the oxidation rate of AlN substrate through the addition of water vapor

To apply a pre-oxidation treatment on aluminum nitride (AlN) substrate is a common practice before its metallization. In the present study, the microstructure of AlN after oxidation either in dry air or in wet air is characterized. The resulting thermal conductivity is measured. With or without the...

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Main Authors: Chun-Ting Yeh, Wei-Hsing Tuan
Format: Article
Language:English
Published: Taylor & Francis Group 2017-12-01
Series:Journal of Asian Ceramic Societies
Subjects:
Online Access:http://www.sciencedirect.com/science/article/pii/S2187076417300076
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author Chun-Ting Yeh
Wei-Hsing Tuan
author_facet Chun-Ting Yeh
Wei-Hsing Tuan
author_sort Chun-Ting Yeh
collection DOAJ
description To apply a pre-oxidation treatment on aluminum nitride (AlN) substrate is a common practice before its metallization. In the present study, the microstructure of AlN after oxidation either in dry air or in wet air is characterized. The resulting thermal conductivity is measured. With or without the presence of water vapor, the oxidation of AlN is a reaction-dominating process. The addition of water vapor speeds up the oxidation rate by one order of magnitude. The surface oxide layer is full of nano-sized pores. The presence of surface oxide reduces the thermal conductivity by ∼15% when the thickness of oxide layer is only 3 μm.
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spelling doaj.art-fd732100d6874495bbf09fdc05a23b082022-12-21T18:38:04ZengTaylor & Francis GroupJournal of Asian Ceramic Societies2187-07642017-12-015438138410.1016/j.jascer.2017.08.001Accelerating the oxidation rate of AlN substrate through the addition of water vaporChun-Ting YehWei-Hsing TuanTo apply a pre-oxidation treatment on aluminum nitride (AlN) substrate is a common practice before its metallization. In the present study, the microstructure of AlN after oxidation either in dry air or in wet air is characterized. The resulting thermal conductivity is measured. With or without the presence of water vapor, the oxidation of AlN is a reaction-dominating process. The addition of water vapor speeds up the oxidation rate by one order of magnitude. The surface oxide layer is full of nano-sized pores. The presence of surface oxide reduces the thermal conductivity by ∼15% when the thickness of oxide layer is only 3 μm.http://www.sciencedirect.com/science/article/pii/S2187076417300076Aluminum nitrideOxidationThermal conductivityMicrostructure
spellingShingle Chun-Ting Yeh
Wei-Hsing Tuan
Accelerating the oxidation rate of AlN substrate through the addition of water vapor
Journal of Asian Ceramic Societies
Aluminum nitride
Oxidation
Thermal conductivity
Microstructure
title Accelerating the oxidation rate of AlN substrate through the addition of water vapor
title_full Accelerating the oxidation rate of AlN substrate through the addition of water vapor
title_fullStr Accelerating the oxidation rate of AlN substrate through the addition of water vapor
title_full_unstemmed Accelerating the oxidation rate of AlN substrate through the addition of water vapor
title_short Accelerating the oxidation rate of AlN substrate through the addition of water vapor
title_sort accelerating the oxidation rate of aln substrate through the addition of water vapor
topic Aluminum nitride
Oxidation
Thermal conductivity
Microstructure
url http://www.sciencedirect.com/science/article/pii/S2187076417300076
work_keys_str_mv AT chuntingyeh acceleratingtheoxidationrateofalnsubstratethroughtheadditionofwatervapor
AT weihsingtuan acceleratingtheoxidationrateofalnsubstratethroughtheadditionofwatervapor