Electrical and microstructural properties of Ta-C thin films for metal gate
Carbon rich Nano-crystalline grain size tantalum carbide (Ta-C) thin films were prepared by non- reactive simultaneously dual magnetron sputtering. The main purpose of the current work was to investigate the influence of deposition method, deposition power, film thickness and annealing temperature o...
Main Authors: | , , , , , |
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Format: | Article |
Language: | English |
Published: |
IOP Publishing
2020-01-01
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Series: | Materials Research Express |
Subjects: | |
Online Access: | https://doi.org/10.1088/2053-1591/aba0e9 |