Study on thermodynamics and kinetics of chemical vapor deposition of silicon nitride
The thermodynamics and kinetics methods had been applied to study the effects of the deposition temperature, the reaction gas ratio and the dilution gas on Si _3 N _4 formation in the SiCl _4 -NH _3 -H _2 system. The studies revealed that raising the deposition temperature would accelerate the chemi...
| Main Authors: | , , |
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| Format: | Article |
| Language: | English |
| Published: |
IOP Publishing
2020-01-01
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| Series: | Materials Research Express |
| Subjects: | |
| Online Access: | https://doi.org/10.1088/2053-1591/abb62f |